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Fujifilm Athmospheric Plasma

Thin layer depositions

Adhesion promotion layer

Adhesion measurements of silica films showed that the ultra-thin depositions also act as an adhesion promotion layer.  With a tensile test machine this improvement of adhesion can be measured.

thin-layer-depositions-tensile-stress-test
Adhesion test at Fujifilm plasma innovation center

Moisture barrier layer

Deposition of SiO2 can be used to make a moisture barrier layer. The water vapour transmission rate (WVTR) of such a barrier can be extremely low.

Surface modification

Also without additional material the plasma modifies the surface of the substrate (a foil). This can be used for the removal of impurities and contaminants, for sterilization and chemical modification to improve wettability (hydrophilic layer) and absorption of dyes.

This Life+ project is supported by the European Commission.
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